fig10

Microstructural evolution and ferroelectricity in HfO<sub>2 </sub>films

Figure 10. (A) P-E hysteresis of HZO thin films deposited on SiO2, Si and CaF2 substrates. (B) Relationship between remanent polarization and deviation of the lattice spacing[117]. HZO: Hf0.5Zr0.5O2.

Microstructures
ISSN 2770-2995 (Online)
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